Production and deposition of copper clusters using magnetron sputtering
Translated title
Author
Term
4. term
Education
Publication year
2014
Submitted on
2014-09-12
Pages
53
Abstract
The aim of the project was to construct and test a setup for producing size selected copper clusters using a magnetron sputtering source. The cluster deposition apparatus has been constructed and a series of experiments were performed to determine the deposition parameters for maximum cluster beam intensity. Different substrate materials were studied which was best suited for further deposition. At the end the cluster size selection was tested at different electrostatic quadropole mass spectrometer (QMS) voltages. Atomic force microscopy revealed that the cluster size increases with the QMS voltage, which is in agreement with the theoretical prediction.
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