Deposition and Characterization of TiN Thin Films
Authors
Term
1. semester
Education
Publication year
2025
Submitted on
2025-12-19
Pages
55
Abstract
In this project, Titanium Nitride thin films have been produced in order to create films with high reflectance in the near infrared region, particularly at a wavelength of 1070 nm. The TiN were deposited on Si(100), graphite and carbon fibers (CFs) substrates using reactive magnetron sputtering. For the reflectance analysis spectrophotometer was utilised, where it was observed that the reflectance increased with deposition temperature. Further optimization through the reduction of process pressure led to maximum reflectance of approximately 84\% on Si(100) substrates. Atomic Force Microscopy (AFM) showed an increase in grain size and a more homogeneous surface morphology by increasing the deposition temperature. Additionally, roughness analysis was conducted showing an overall increase in surface roughness. Energy Dispersive Spectroscopy (EDS) was used to estimate the thickness of the TiN films, where deposition rate was found to be higher at lower pressures. However it was assumed that the increased film thickness does not affect the reflectance. Subsequently, TiN coatings were deposited on graphite substrate with the same optimal deposition parameters as for the Si(100), revealing lower reflectance compared to films grown on Si(100). Adhesion tests indicated relatively stronger interface between TiN and graphite rather than graphite itself. Optical Microscope images showed that TiN was deposited successfully on CFs, however adhesion tests were inconclusive.
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