The aim of the project was to construct and test a setup for producing size selected
copper clusters using a magnetron sputtering source. The cluster deposition apparatus
has been constructed and a series of experiments were performed to determine the
deposition parameters for maximum cluster beam intensity. Different substrate materials
were studied which was best suited for further deposition. At the end the cluster
size selection was tested at different electrostatic quadropole mass spectrometer (QMS)
voltages. Atomic force microscopy revealed that the cluster size increases with the QMS
voltage, which is in agreement with the theoretical prediction.